Heat activated nanometer-scale pump

ABSTRACT

A pump is provided that includes a nanometer-scale beam that is suspended in a housing. The housing may include a number of apertures such that molecules can move in and out of the housing. The nanometer-scale beam may be suspended as a jump rope or as a cantilever. The movement of the nanometer-scale beam may be mechanically stopped from moving in a particular way (e.g., towards a particular end of the housing). Thus, for example, the beam and the stop work together to pump molecules in the direction that the beam bounces off the stop. The speed and movement of the nanometer-scale beam can also be influenced either electrostatically or electromagnetically. As such, the speed and direction that a working substance is pumped by a nanometer-scale beam may be electrically controlled.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional PatentApplication No. 60/700,894 filed on Jul. 19, 2005 entitled “HEATACTIVATED NANOMETER-SCALE PUMP” (Docket No. AMB/007 PROV), which ishereby incorporated by reference herein in its entirety.

BACKGROUND OF THE INVENTION

This invention relates to nanometer-scale electromechanical systems(NEMs).

Nanometer-scale beams, such as carbon nanotubes and nanowires, can nowbe grown and assembled into a wide-variety of configurations. It istherefore desirable to fabricate nanometer-scale, as well asmicrometer-scale, electromechanical structures that are operable toachieve a variety of useful functions.

Diamonds can now also be fabricated on semiconductor and shaped intouseful structures. For example, a layer of diamond can be deposited andformed on a layer of semiconductor through a Chemical Vapor Deposition(CVD) process. The layer of diamond can then be etched.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide nanometer-scale, aswell as micrometer-scale, structures that may be utilized in a varietyof applications.

A pump is provided that includes a nanometer-scale beam, such as carbonnanotube or nanowire, that is suspended in a housing. The housing mayinclude a number of windows such that molecules can move in and out ofthe housing. The nanometer-scale beam may be suspended as a jump rope(e.g., suspended loosely at both ends such) or as a cantilever (e.g.,suspended at only one end). In placing a nanometer-scale beam parallelto a window, or in the vicinity of a window, the kinetic energy of amolecule entering the housing can advantageously be manipulated andutilized.

A mechanical stop may be provided to limit the potential movement of thenanometer-scale beam. Such a mechanical stop may be placed perpendicularto the nanometer-scale beam and located between the nanometer-scale beamand one of the windows. The mechanical stop may be, for example, anothernanometer-scale beam, such as a nanotube or a nanowire, or a layer ofcarbon (e.g., a diamond).

A nanometer-scale beam may oscillate and move as a result of thermalvibrations in a working substance. Alternatively, heat, such as heatsupplied by a heat source, may cause the molecule(s) of ananometer-scale beam to move. For example, a carbon nanotube, suspendedat one or both ends, may oscillate when heated.

When unusually fast working substance molecules hit part of ananometer-scale beam located opposite a mechanical stop, the moleculeswill force the beam to rapidly move toward the mechanical stop, impactthe stop, and then the beam may reverse its motion due to the collisionwith the stop. Instead of striking the working substance molecules in adirection toward the stop, the beam strikes working substance moleculesin the opposite direction away from the stop. Thus, the beam and thestop work together to pump working substance molecules in a directionaway from the stop. Thus, for example, the beam and the stop worktogether to pump molecules in the direction that the beam bounces offthe stop.

In this manner, the movement of the nanometer-scale beam may bemechanically stopped from moving in a direction towards a window (or anyparticular direction or directions). Thus, the movement of thenanometer-scale beam may be mechanically influenced to move in aparticular manner (e.g., in a particular range of motion). Thus, amolecule entering a window may impact the nanometer-scale beam and causethe nanometer-scale beam to move away from the window. In turn, theimpacting molecule may, for example, bounce back through the window.Meanwhile, the nanometer-scale beam may impact a molecule residing inthe housing. Thus, the impacted molecule may be forced through anotherwindow (e.g., a window opposite the window that is guarded by thenanometer-scale beam). The nanometer-scale beam may also be movedelectrostatically or electromagnetically. Thus, the speed and directionthat a nanometer-scale beam moves in may be controlled.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects and advantages of the present invention willbe apparent upon consideration of the following detailed description,taken in conjunction with accompanying drawings, in which like referencecharacters refer to like parts throughout, and in which:

FIG. 1 is an illustration of a pump having a nanometer-scale beamconstructed in accordance with the principles of the present invention;

FIG. 2 is an illustration of an exterior perspective of a pump having ananometer-scale beam constructed in accordance with the principles ofthe present invention;

FIG. 3 is an illustration of a cross-section of a pump having ananometer-scale beam constructed in accordance with the principles ofthe present invention;

FIG. 4 is an illustration of a cross-section of a pump having ananometer-scale beam constructed in accordance with the principles ofthe present invention;

FIG. 5 is an illustration of a number of pump modules constructed inaccordance with the principles of the present invention;

FIG. 6 is an illustration of an exterior view of a number of pumpmodules constructed in accordance with the principles of the presentinvention;

FIG. 7 is an illustration of a cross-section of a number of pump modulesconstructed in accordance with the principles of the present invention;

FIG. 8 is an illustration of nanometer-scale beam having a mechanicalstop constructed in accordance with the principles of the presentinvention;

FIG. 9 is an illustration of a pump having a nanometer-scale beamconstructed in accordance with the principles of the present invention;and

FIG. 10 is an illustration of the exterior of pump having ananometer-scale beam with an external mechanical stop constructed inaccordance with the principles of the present invention;

FIG. 11 is an illustration of a housing constructed in accordance withthe principles of the present invention;

FIG. 12 is an illustration of a housing having multiple pumpsconstructed in accordance with the principles of the present invention;

FIG. 13 is an illustration of a housing having multiple pumpsconstructed in accordance with the principles of the present invention;

FIG. 14 is an illustration of a nanometer-scale cantilever constructedin accordance with the principles of the present invention;

FIG. 15 is an illustration of a nanometer-scale cantilever constructedin accordance with the principles of the present invention;

FIG. 16 is an illustration of a sphere having multiple nanometer-scalebeams located on the exterior surface of the sphere constructed inaccordance with the principles of the present invention;

FIG. 17 is an illustration of a housing having multiple electricallycontrolled nanometer-scale beams constructed in accordance with theprinciples of the present invention;

FIG. 18 is an illustration of a housing having multiple electricallycontrolled nanometer-scale beams constructed in accordance with theprinciples of the present invention;

FIG. 19 is an illustration of multiple electrically controllednanometer-scale beams constructed in accordance with the principles ofthe present invention;

FIG. 20 is an illustration of multiple electrically controllednanometer-scale beams constructed in accordance with the principles ofthe present invention;

FIG. 21 is an illustration of multiple nanometer-scale beams constructedin accordance with the principles of the present invention;

FIG. 22 is an illustration of multiple nanometer-scale beams constructedin accordance with the principles of the present invention;

FIG. 23 is an illustration of multiple nanometer-scale beams constructedin accordance with the principles of the present invention; and

FIG. 24 is an illustration of multiple nanometer-scale beams constructedin accordance with the principles of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

U.S. patent application Ser. No. 09/885,367 filed on Jun. 20, 2001 thatissued as U.S. Patent No. 6,593,666 on Jul. 15, 2003 (Attorney DocketNo. JP/001) is hereby incorporated by reference herein in its entirety.

U.S. patent application Ser. No. 10/453,326 filed on Jun. 2, 2003(Attorney Docket No. AMB/002) is hereby incorporated by reference hereinin its entirety.

U.S. patent application Ser. No. 10/453,783 filed on Jun. 2, 2003(Attorney Docket No. AMB/003) is hereby incorporated by reference hereinin its entirety.

U.S. patent application Ser. No. 10/453,199 filed on Jun. 2, 2003(Attorney Docket No. AMB/004) is hereby incorporated by reference hereinin its entirety.

U.S. patent application Ser. No. 10/453,373 filed on Jun. 2, 2003(Attorney Docket No. AMB/005) is hereby incorporated by reference hereinin its entirety.

U.S. patent application Ser. No. 11/185,219 filed on Jul. 19, 2005(Attorney Docket No. AMB/006) is hereby incorporated by reference hereinin its entirety.

FIG. 1 shows system 100 that includes nanometer-scale beam 151 suspendedfrom mounting 170 as a cantilever. Nanometer-scale beam 151 is suspendedinside of housing 110. Housing 110 includes two windows, window 130 and120, that are aligned to one another on opposite sides of housing 110.The portion of nanometer-scale beam 151 not fixed to mount 170 isfree-to-move. This portion may have a resting location aligned withwindow 130. For example, the free-to-move portion of nanometer-scalebeam 150 may be aligned in parallel with window 130. At a result, amolecule entering window 130 (e.g., molecule 161) from the exterior ofhousing 110 may impact nanometer-scale beam 150 and cause, for example,nanometer-scale beam 151 to move through position 152 to position 150.In this manner, a molecule residing in housing 110 may be impacted andforced out of housing 110 through window 120. Mechanical stop 140 may beprovided to prevent nanometer-scale beam 151 from moving in a directiontowards window 130 that nanometer-scale beam 151 would otherwise be ableto move in.

Mechanical stop 140 may take a variety of forms. For example, mechanicalstop may take the form of a nanometer-scale beam, such as a nanotube,positioned between window 130 and nanometer-scale beam 150. Mechanicalstop 140 may be provided perpendicular to nanometer-scale beam 150 suchthat a minimal area in front of window 130 is blocked.

Persons skilled in the art will appreciate that moving nanometer-scalebeam 151 either electrostatically or electromagnetically (collectivelyreferred to as moving nanometer-scale beam 150 electrically) in thepresence of mechanical stop 140 will shape the movement pattern ofnanometer-scale beam. Thus, a variety of different types of pumps may beprovided that offer a variety of different thrust profiles. Such aprofile can be changed, for example, by changing the location ofmechanical stop 140. If mechanical stop 140 is a nanotube, for example,mechanical stop 140 may include slack such that the slacked portion canbe moved electrostatically or electromagnetically. In providing multipleelectrically controllable stops around a nanometer-scale beam, themovement pattern of the nanometer-scale beam may be modified in avariety of ways.

Persons skilled in the art will appreciate that a number ofnanometer-scale beams 151 may be included in housing 110. Similarly anumber of windows may be included in housing 110. Moreover, the size ofa window may be dynamically changed in a variety of ways. For example,two nanometer-scale beams may be located behind opposite edges of awindow such that the beams are not located in front of the window, butadjacent to the window. These nanometer-scale beams may be suspended andhave slack such they may be electrically controlled to move in front ofthe window. In such a manner, the nanometer-scale beams can becontrolled to form a new edge of the window and decrease the sides ofthe window perpendicular to the nanometer-scale beams by, for example,the thickness of the nanometer-scale beams. Such movement may be useful,for example, to increase thrust at a particular point in a window.

Persons skilled in the art will appreciate that if a mechanical stop ismade from an electrically conductive material (e.g., a carbon nanotube),then the mechanical stop may be utilized to generate electrostaticforces to interact with a nanometer-scale beam to shape the movementpattern of that nanometer-scale beam.

A nanometer-scale beam may oscillate and move as a result of thermalvibrations in a working substance. Alternatively, heat, such as heatsupplied by a heat source, may cause the molecule(s) of ananometer-scale beam to move. For example, a carbon nanotube, suspendedat one or both ends, may oscillate when heated. For example, a carbonnanotube may oscillate at any temperature above absolute zero.

FIG. 2 shows system 200 that includes housing 210, nanometer-scale beam240, and mechanical stop 230 aligned in front of window 220.Nanometer-scale beam operates as follows. Molecule 252 enters window 220and moves nanometer-scale beam 240 away from window 220. Thus,nanometer-scale beam 240 may impact molecule 252 and send molecule 252out of a window opposite that of window 220. However, if molecule 252were to impact nanometer-scale beam 240 and cause nanometer-scale beam240 to move towards window 220, the movement of nanometer-scale beam 240would be stopped and reversed by mechanical stop 230. Mechanical stop230 may be placed anywhere in housing 210 such as, for example, alignedwith the middle of window 220 and located perpendicular tonanometer-scale beam 240. The length of nanometer-scale beam 240 may,for example, traverse the entire length of window 220 or only to alength slightly past mechanical stop 230.

Persons skilled in the art will appreciate that no mechanical stop isrequired to limit the movement of a nanometer-scale beam. For example,if the nanometer-scale beam is longer than a window, and placed adjacentto the window, then the sides of the window will stop thenanometer-scale beam from moving outside of the window. Persons skilledin the art will also appreciate that housing 210 may be provided as amodule and may be aligned with similar modules to, for example, increasethe thrust produced by an array of such modules.

FIG. 3 shows system 300 that is cross-section A-A of system 200 of FIG.2. System 300 may include housing 310, windows 320 and 330,nanometer-scale beam 351 being operable to move into at least positions350 and 352, mounting 370, molecules 362 and 361 and mechanical stop340.

FIG. 4 shows system 400 that is cross-section B-B of system 200 of FIG.2. System 400 may include housing 410, windows 420 and 430,nanometer-scale beam 451 being operable to move into at least positions450 and 452, mounting 470, molecules 462, 463, 461 and mechanical stop440.

FIG. 5 shows system 500 that includes a number of pump modules 511-517and 521-527 similar to, for example, system 100 of FIG. 1. Such modulesmay be anchored to a single base 501. The windows of a number of modulesmay be aligned together to form rows of such modules (e.g., the rowincluding modules 511-517). A number of these rows may be provided toform, for example, a large pump. Thus, a row (e.g., the row includingmodules 511-517) may share a common input window (e.g., window 557) anda common output window (not shown).

FIG. 6 shows system 600 that includes pump modules 610, 620, and 630aligned adjacent to one another and anchored to base 601.

FIG. 7 shows system 700 that shows cross-sectional C-C of system 600 ofFIG. 6. System 700 includes a number of modules anchored to base 701.The modules are anchored in rows (such as the row defined by modules 710and 720). Each module may include, for example, separate housing 710,mechanical stop 714, windows 715 and 711, nanometer-scale beam 713, andmounting 712. Persons skilled in the art will appreciate that adjacentmodules may share a common wall. For example, modules 710 and 720 mayshare a common wall (or may have separate walls such that differentarrays of modules can be easily fabricated).

FIG. 8 shows system 800 that may include a mechanical stop that may beparallel to a nanometer-scale beam. Such a mechanical stop may be, forexample, fabricated from a layer of carbon (e.g., a diamond film). Forexample, mounting 820 may be formed that is originally the length ofdiamond film 830. A diamond film may then be deposited on mounting 820.A portion of the mounting may then be etched away such that the diamondfilm extends past the etched mounting 820. The length of such a diamondfilm can extend, for example, to the closest edge of a window. Personsskilled in the art will appreciate that the thermal, electrical, andstructural properties of a diamond may be utilized in a number of waysin system 800.

FIG. 9 shows system 900 that includes nanometer-scale beam 910 with adiameter approximately equal, or greater than, the diameter of window920.

FIG. 10 shows system 1000 that includes housing 1010 and window 1020.Nanometer-scale beam 1030 is suspended inside housing 1010. Diamondfilms, or one or more nanotubes, may be placed across window 1020 andact as mechanical stops. For example, a diamond film can be fixed toeither the interior, or exterior, surface of housing 1010 at locations1040 or 1050. Persons skilled in the art will appreciate that a diamondfilm may be deposited and formed on a substrate. The substrate may thenbe etched away—leaving just the diamond film. This diamond film can thenbe placed on another object (e.g., housing 1010). Alternatively, adiamond film can be formed on a housing and then a window can be etchedinto the housing about a diamond film.

FIG. 11 shows assembly 1100 that may include a single housing thatincludes top housing portion 1110 and base 1120. Inlet/Outlet apertures1111, 1112, and 1113 may be included in housing portion 1110 to allow aworking substance to enter, or exit, the single housing. Any number ofheat-activated pumps may be included in the single housing. For example,the single housing may include millions of nanometer-scale pumps basedon nanometer-scale beams having a portion that is free-to-move (e.g.,cantilevers or jump ropes). Such nanometer-scale beams may be driven bythermal vibrations that exist in a working substance (e.g., a gas,liquid, or plasma). Mechanical stops may be placed in the vicinity of afree-moving portion of any number of nanometer-scale beams in order toinfluence the speed and direction the free-moving portion is able tomove. The movement of the free-moving portion may also be influencedelectrically (e.g., either electrostatically or electromagnetically).

For example, charge member layers may be included in the proximity of afree-moving portion such that a charge (e.g., a DC voltage) placed on acharge member layer creates a force that can electrostatically interactwith the free-moving portion. Expanding this example, a second charge(e.g., a DC or AC voltage) may be placed on the nanometer-scale beamsuch that the second charge can electrostatically interact with thecharge imposed on the nearby charge member layer. By electricallyinfluencing a heat-activated pump, the movement of the nanometer-scalebeam generated by the thermal vibrations of the working substance and/orbeam molecules may be influenced. For example, the maximum displacementlocations, with respect to a resting location, of a movingnanometer-scale beam may be modified.

A nanometer-scale beam may oscillate and move as a result of thermalvibrations in a working substance. Alternatively, heat, such as heatsupplied by a heat source, may cause the molecule(s) of ananometer-scale beam to move. For example, a carbon nanotube, suspendedat one or both ends, may oscillate when heated.

FIG. 12 shows system 1200 that may include top housing portion 1210 andbase 1220. Apertures of the same (or different) shape and size having auniform (or non-uniform) spacing between the apertures may be providedon housing portion 1210. For example, aperture 1211 may be provided onhousing portion 1210. A portion of mechanical stop 1230 may bevertically and horizontally aligned with aperture 1211. Mechanical stop1230 may be utilized to limit the movement of nanometer-scale beam 1241in one or more directions. Nanometer-scale beam 1241 may beheat-activated such that motion is generated in nanometer-scale beam1241 as a result of, for example, thermal vibrations in a workingsubstance including multiple molecules 1251.

FIG. 13 shows nanoelectromechanical system 1300 that included numerousnanometer-scale beams that may be used for pumping a working substanceor sensing characteristics about a working substance. System 1300 may becross-sectional D-D (i.e., line 1920) of housing 1200 of FIG. 12.

FIG. 13 includes housing portion 1310 fixed to base portion 1320 to forma housing. Apertures 1361 and 1362 are included in housing portion 1310.A working substance may be passed through apertures 1361 1362. Apertures1361 and 1362 may be provided on opposite walls of housing 1310 and maybe aligned both vertically and horizontally. For example, a workingsubstance may enter, or may be influenced to enter, aperture 1361. Aworking substance may be influenced to enter an aperture in numerousways. For example, the heat exhaust of a system may be coupled directedto an aperture such that a heated working substance is exhausted intothe chamber defined by housing portions 1310 and 1320.

Any number of nanometer-scale pumps may be provided in system 1300. Suchnanometer-scale pumps may be positioned in any number of rows andcolumns. Rows and/or columns may additionally be aligned with aperturessuch as apertures 1361 and 1362. For example, the midpoint, or any pointof each of the nanometer-scale beams of a nanometer-scale pump may bealigned with the midpoint of an aperture.

Nanometer-scale pumps may be fabricated from nanometer-scale beams. Suchnanometer-scale beams may be suspended from one end to form a cantileveror from both ends to form a jump rope. Thus, a suspended nanometer-scalebeam may include at least one portion that is free to move. Ananometer-scale beam that is attached to a mount only in the center ofthe nanometer-scale beam may, for example, have two portions that arefree-to-move.

Mechanical stop 1334 may be provided to limit the movement of ananometer-scale beam in one or more directions. Mechanical stop 1334 maybe a nanometer-scale beam or any other type of structure. For example,mechanical stop 1334 may be a nanotube, or nanowire, positionedperpendicular to base 1320 (e.g., grown vertically from base 1320).Mechanical stop support 1335 may also be provided to mechanicallysupport mechanical stop 1335.

Mechanical stop 1334 may be non-conductive and mechanical stop support1335 may be conductive such that a charge may be placed on mechanicalstop support 1334. As mechanical stop 1334 may be non-conductive,mechanical stop 1334 may insulate nanometer-scale beam 1333 from makinga physical electrical connection, but may still allow for a charge onmechanical stop support 1335 to electrostatically interact withnanometer-scale beam 1333. Particularly, a charge on mechanical stopsupport 1334 may electrostatically interact with a charge onnanometer-scale beam 1333.

A charge may be applied to nanometer-scale beam 1333. Such a charge maybe controlled, in both polarity and magnitude, by control circuitry.Accordingly, nanometer-scale beam 1333 may be electrically coupled to aninterconnection. Such an electrical coupling may occur through mounting1331 and/or mounting 1332. Alternatively, an electrical interconnectionmay be physically connected to nanometer-scale beam 1333.

A nanometer-scale beam may also be electrostatically influenced fromcharge members located around a nanometer-scale beam. For example,multiple charge member layers may be located beneath, in, or above base1320 and positioned near a nanometer-scale beam.

Persons skilled in the art will appreciate that the position of amechanical stop may limit the range of a nanometer-scale beam. Forexample, changing the distance from a mechanical stop to ananometer-scale beam in a resting location, or the position relative toa midpoint of the nanometer-scale beam, may affect the range thenanometer-scale beam can move. Additionally, multiple stops may beplaced around a beam. For example, a stop on one side of a beam may betwice as far from the beams resting position as a stop on the other sideof the beam.

System 1300 may also, for example, be utilized to sense the movement ofmolecules or the movement of a housing. For example, mechanical stop1334 may be electrically conductive and control circuitry may provide acharge on the mechanical stop from a source of electrical energy (e.g.,a voltage source). Thus, for example, whenever a nanometer-scale beamphysically touches a mechanical stop, the beam may take on a chargesimilar to the stop. Sense circuitry may be coupled to thenanometer-scale beam to determine when the beam takes on a charge. Thefrequency of such occurrences may, for example, be indicative of thespeed that a nanometer-scale beam is cycling in. Such a sensingcapability may be utilized in numerous applications. For example, such asensing capability may be utilized to implement an accelerometer orother inertial movement sensing device. As per another example, such asensing capability may be utilized after fabrication, or at any time, todetermine which nanometer-scale beams are not working (e.g., werefabricated incorrectly or have failed). Accordingly, control circuitry,such as a processor, may utilize an array of pumps in a particularmanner in response to failed pumps. As per yet another example, such asensing capability may be utilized to determine how a working substanceis moving through certain regions such that pumps in those regions (orother regions) may be electrically influenced in a particular manner.

Persons skilled in the art will appreciate that nanometer-scale beam1333 may be electromagnetically influenced instead of electrostaticallyinfluenced. For example, a magnetic field generator may be provided in,or outside of, housing 1310 and may provide a magnetic field thatinteracts with a current running through nanometer-scale beam 1333. Assuch, a current may be run through nanometer-scale beam 1333 and thedirection and magnitude of the current may be controlled by controlcircuitry.

Persons skilled in the art will appreciate that a pump does not need anytype of electrical influence to operate. A molecule may, for example,impact a free-moving portion of a nanometer-scale beam and cause thefree-moving portion to move. The movement of the free-moving portion maybe limited, and influenced, mechanically by a mechanical stop. Thus, aheat-activated pump may be realized. Thermal vibrations may occur in aworking substance having a particular temperature that appears uniformon the macrometer scale. Such thermal vibrations may activate the pumpsto operate even in a working substance having a particular temperaturethat appears uniform on the macrometer scale.

In addition to influencing pumps thermally, pumps may be electricallycontrolled. For example, pumps may be electrically controlled to move ina particular way at a particular time. Thus, multiple nanometer-scalebeams may be moved in relation to one another in order to maximizethrust in a particular direction or directions. For example,nanometer-scale beam 1351 may be away from a mechanical stop whilenanometer-scale beam 1354 is away from a mechanical stop.Nanometer-scale beam 1352 may be near, or passing through, a restinglocation while nanometer-scale beam 1355 is near, or passing through, aresting location. Nanometer-scale beam 1353 may be physically contactinga mechanical stop while nanometer-scale beam 1356 is physicallycontacting a mechanical stop.

FIG. 14 shows pump 1400 that may include nanometer-scale beam 1420 andmechanical stop 1451 and 1452. Charge member layers 1432 and 1433 may beprovided and may be located under an isolation layer. As such,mechanical stops may be isolated from charge member layers andnanometer-scale beam 1420 may be influenced depending on the thicknessand composition of the isolation layers. Nanometer-scale beam 1420 maybe suspended from mounting 1431 on one end (e.g., to form a cantilever)or both ends (to form a jump rope). Mounting 1431 may also be, forexample, conductive such that a charge may be imposed on nanometer-scalebeam 1420. Alternatively, mounting 1431 may be non-conductive such thatnanometer-scale beam 1420 may be isolated.

FIG. 15 shows pump 1500 that may be cross-sectional E-E (i.e., line1490) of FIG. 14. Pump 1500 may include base 1540, isolation layer 1551,charge member layer 1561, charge member layer 1562, mounting assembly1510, mechanical stop 1531, mechanical stop 1532, and nanometer-scalebeam 1520. Nanometer-scale beam 1520 may be fixed to mounting assembly1510 at end 1521 to form a cantilever (and may also be fixed at anothermounting assembly on the end opposite end 1521 to form a jump rope).

Persons skilled in the art will appreciate that charge member layer 1561may be provided with a charge of one polarity while charge member layer1562 is provided with a charge having an opposite polarity. For example,charge member layer 1561 may be provided with a positive charge whilecharge member layer 1562 is provided with a negative charge. Thus, ifnanometer-scale beam 1520 is provided with a positive charge,nanometer-scale beam 1520 may be influenced towards charge member layer1562 and away from charge member layer 1561. Alternatively, for example,if nanometer-scale beam 1520 is provided with a negative charge andcharge member layer 1561 is provided with a positive charge,nanometer-scale beam 1520 may be influenced towards charge member layer1561.

The charges on any particular charge member layer, or anynanometer-scale beam, may be provided at any particular time andadjusted in polarity and magnitude by control circuitry (e.g., aprocessor). Multiple nanometer-scale beams or charge member layers maybe arrayed together in a parallel configuration, series configuration, acombination of parallel and series configurations, or any otherconfigurations. Doing so may, for example, allow control circuitry tocontrol the charges of multiple charge member layers and/ornanometer-scale beams by controlling a single node.

Persons skilled in the art will appreciate that a particular workingsubstance operating in a particular manner may cause nanometer-scalebeam 1520 to have an average and a maximum displacement towardsmechanical stop 1531 and 1532 with respect to a resting location. Such aresting location may be configured to be, for example, the midpointbetween mechanical stop 1531 and 1532. Thus, properly configured chargeson charge member layers 1561 and 1562 may adjust such average andmaximum displacements by, for example, shifting these displacementstowards a particular stop or stops.

FIG. 16 shows system 1600 that includes spherical base 1610 thatincludes numerous nanometer-scale pumps 1640 (or sensors) on theexterior surface of spherical base 1610. Each nanometer-scale pump mayinclude, for example, nanometer-scale beam 1642 and mechanical stop1641. Persons skilled in the art will appreciate that spherical base1610 may be fabricated in a shape other than a sphere such as, forexample, a cube, cylinder, pyramid, or any other three-dimensionalstructure.

Spherical base 1610 may form a chamber inside spherical base 1610 suchthat additional circuitry and nanometer-scale systems (e.g.,pumps/sensors) may be placed inside of spherical base 1610. For example,control and power circuitry 1630 may be placed in the center ofspherical base 1610 and held in place by supports 1670. Control andpower circuitry may be positioned such that the center of gravity ofspherical base 1610 and control and power circuitry 1630 areapproximately equal. Thus, if spherical base 1610 were to be rolled, theroll would be relatively uniform and the sphere would not wobble orfavor a particular spot of spherical base 1610. Supports 1620 may alsoinclude interconnections (e.g., supports 1620 may be hollow) to send andreceive signals (e.g., power/control/sense signals) to and fromnanometer-scale assemblies located on the exterior of spherical base1610.

The spherical nature of spherical base 1610 may be useful, for example,as a propulsion system. Nanometer-scale pumps may push molecules of aworking substance in any direction away from mechanical stop 1641 and,as such, may propel spherical base 1610 in any direction. Additionalcircuitry may be included in spherical base 1610 such as, for example, acommunications receiver and transmitter. Similarly, additional circuitrymay be placed on the exterior surface of spherical base 1610 such as,for example, sensors. Thus, the external sensors may obtain informationand transmit such information through the communications transmitter.Spherical base 1610 may then move to take new sensor readings.

FIG. 17 shows system 1700 that may include housing portion 1710, housingportion 1740 (e.g., a base), charge member layer 1750, isolation layer1730, mechanical stops 1770 and 1760, and inlet and/or outlet aperture1780.

FIG. 18 shows system 1800 that includes isolation layer 1850, mechanicalstops 1833 and 1832, nanometer-scale beam 1840, aperture inlets and/oroutlets 1881-1183, housing portions 1820 and 1810.

FIG. 19 shows system 1900 that may be, for example, similar tocross-section F-F (i.e., line 1891) of system 1800 of FIG. 18. System1900 includes nanometer-scale beams in a cantilever configurations thatare located along a common channel between an input aperture and anoutput aperture, but that have free-moving portions that face multipledirections. For example, nanometer-scale beam 1922 faces one directionwhile nanometer-scale beam 1931 faces another direction. By facingnanometer-scale beam cantilevers in opposite directions, the mechanicalstops for each beam may be aligned with one another. Doing so, reducesthe surface area required for a nanometer-scale pump such that morenanometer-scale pumps may be located in a particular housing or on aparticular surface.

The midpoints of the free-moving portions of nanometer-scale beam 1931and 1922 may be aligned with one another. Nanometer-scale beam 1922 mayutilize mechanical stops 1912 and 1911. Nanometer-scale beam 1931 mayutilize mechanical stops 1941 and 1942. Mechanical stops 1941 and 1911may be aligned with one another due to, for example, nanometer-scalebeams 1922 and 1931 facing in opposite directions. Molecules 1921 maydrift, or be pushed, into system 1900 through an aperture.Nanometer-scale beam 1922 may be fixed to mounting 1920. Nanometer-scalebeam 1931 may be fixed to mounting 1930.

Persons skilled in the art will appreciate that common charge membersmay be located underneath, for example, aligned stops such that a chargemember layer may influence two, or more than two, nanometer-scale beams.Alternatively, a charge member layer may be positioned, and fabricated,such that the charge member layer can only influence a singlenanometer-scale beam. If, however, a charge member layer influences twonanometer-scale beams that are positioned in opposite directions thenone, more, or all of, the nanometer-scale beams may be provided a chargeof one polarity while all of the nanometer-scale beams that face in theopposite direction may be provided with a charge of an oppositepolarity. In doing so, a charge member layer may influence bothnanometer-scale beams in the same way. For example, a charge memberlayer having a positive charge may push a positively chargednanometer-scale beam 1922 in one direction and may attract a negativelycharged nanometer-scale beam 1931 in the same direction. Eachnanometer-scale beam may be isolated from one another and may beprovided with its own charge having a particular polarity and magnitude.

FIG. 20 shows system 2000 that may be, for example, similar tocross-section G-G (i.e., line 1892) of system 1800 of FIG. 18. System2000 may include any number of nanometer-scale beams 2030 fixed tomounting 2040 and limited in movement by mechanical stops 2060 and 2050.Nanometer-scale beam 2030 may be electrically influenced by chargemember layer 2080 physically isolated from nanometer-scale beam 2030 byisolation layer 2070. Housing portions 2090 and 2010 may provide achamber to house nanometer-scale beam 2030 and may provide aperture 2099to access the chamber.

FIG. 21 shows system 2100 that may include a housing defined by portions2110 and 2111. An aperture (not shown) may be located underneath space2110 and above portion 2111 such that a working substance may flowin/out from the aperture in-between nanometer-scale pumps. Charge memberlayer 2120 may be included to electrically influence nanometer-scalebeams 2131-2133. Charge member layer 2121 may be included toelectrically influence nanometer-scale beams 2134-2136. Charge memberlayers 2120 and 2121 may be isolated from nanometer-scale beams or maynot be isolated from nanometer-scale beams. By not isolating a chargemember layer, the layer may have a more profound influence on aparticular nanometer-scale beam. Additionally, a charge member able tophysically connect with a nanometer-scale beam may be utilized toreceive a charge from a nanometer-scale beam (e.g., sense theconnection) or provide a charge directly to the nanometer-scale beam(e.g., if the beam is used to sense the connection). A mechanical stopmay be utilized to also provide such sensing methodologies.

Mountings for nanometer-scale beams may also provide a charge to ananometer-scale beam. For example, a charge may be provided tonanometer-scale beam 2133 through mounting 2141 (or though a differentelectrical connection). Thus, a positive charge on nanometer-scale beams2131-2133 and a positive charge on charge member layer 2120 may, if ofthe proper magnitude, lift nanometer-scale beams 2131-2133 such that thebeams are a particular vertical distance from charge member layer 2120.Nanometer-scale beams 2131-2133 may then operate at this verticaldistance. Thus, for example, the operation of nanometer-scale beams maybe easily turned ON and OFF. For example, a charge member layer such ascharge member layer 2121 may be provided with a negative charge andnanometer-scale beams 2134-2136 may be provided with a positive charge.Thus, nanometer-scale beams 2134-2136 may be attracted to charge memberlayer 2121 and may, if strong enough, physically connect to, andelectrically latch onto, charge member layer 2121. In this manner, thenanometer-scale pumps may not respond to a working substance passing bythe pumps, or attempting to heat-activate the pumps. Persons skilled inthe art will appreciate that charge member layers may be utilized onlyto attract a nanometer-scale beam as the nanometer-scale beams may beheat-activated and pump as a result of thermal vibrations in a workingsubstance and/or nanometer-scale beam. Thus, charge member layers may beutilized only to stop particular nanometer-scale beams from moving(e.g., turning those beams OFF). As such, a charge member layer may beconfigured only to receive a charge of a particular polarity (e.g.,positive or negative) and a nanometer-scale beam in the vicinity of sucha charge member layer may be configured only to receive a charge of anopposite polarity (e.g., negative or positive, respectively).

Housing portion 2151 may be, for example, the perspective taken fromcross-section H-H of housing portion 2110 (e.g., line 2149).Nanometer-scale beam 2161 may be mounted on mounting 2180. Mechanicalstop 2171 (e.g., a carbon single or multi-walled nanotube) may be, forexample, aligned with the end of free-moving portion 2162 such as thetip of nanometer-scale beam 2161 impacts stop 2171 when displaced towardstop 2171. Stop 2171 may be located on the side of nanometer-scale beam2161 away from aperture 2199 and toward an aperture located aboutlocation 2197. Stop 2181 may be located on an opposite side ofnanometer-scale beam 2191 such as the side toward an aperture locatedabout position 2198 and away from aperture 2199. Person skilled in theart will appreciate that a nanometer-scale beam may be limited in rangeof movement on the side having a mechanical stop. Thus, thenanometer-scale beam may have an extended range of movement on a sidewithout a mechanical stop. Thus, both nanometer-scale beams 2161 and2191 may have extended range of motion towards aperture 2199 that islocated between nanometer-scale beams 2161 and 2191 and have limitedrange of motion towards apertures 2197 and 2198, respectively.

FIG. 22 shows nanometer-scale beams 2221-2223 that are turned OFF bycharge member layer 2211 and nanometer-scale beams 2224-2226 that are inoperation as a result of the state of charge member layer 2212 (e.g., nocharge being provided to layer 2212). Base 2251 may be, for example,cross sectional I-I (i.e., line 2299). Persons skilled in the art willappreciate that a charge member layer may extend the length of ananometer-scale beam. For example, a charge member layer may be providedunderneath (and unexposed) the entire nanometer-scale beam 2261, theentire portion of nanometer-scale beam 2261 that is free-moving, or justaround tip portion 2262 of nanometer-scale beam 2261.

Persons skilled in the art will appreciate that one or more sources ofheat may be placed in the vicinity of nanometer-scale pumps or a workingsubstance being utilized by nanometer-scale pumps. For example, heatsources 2281 and 2282 may be utilized to heat separate, or the same,nanometer-scale pumps. Nanometer-scale beams may move in reaction toheat even without a working substance or electrical influence/control.Particularly, the molecule(s) of a nanometer-scale beam may oscillate inreaction to heat. Thus, nanometer-scale pumps may operate as, forexample, a vacuum-pump and may be powered by heat sources 2281 and/or2282. Multiple heat sources may be utilized at different temperatures tochange the amount of heat imposed on any particular nanometer-scalebeams. Thus, the rate of movement of any particular nanometer-scalepumps may be influenced by heat. Heat sources 2281 and 2282 may bemechanically coupled to a chamber having any number of nanometer-scalebeams and/or pumps.

Turning nanometer-scale beams 2221-2223 ON, and nanometer-scale beams2224-2226 OFF, may cause a working substance to be pumped from the leftof nanometer-scale beams 2221-2223 to the right of nanometer-scale beams2221-2223 and, for example, past nanometer-scale beams 2224-2226.Turning nanometer-scale beams 2221-2223 ON, and nanometer-scale beams2224-2226 OFF, may cause a working substance to be pumped from the rightof nanometer-scale beams 2224-2226 to the left of nanometer-scale beams2224-2226 and, for example, past nanometer-scale beams 2221-2223.

Persons skilled in the art will appreciate that a mechanical stop may bemechanically moved toward or away from a nanometer-scale beam. Forexample, a piezoelectric layer may be coupled to a mechanical stop(e.g., a nanotube) and an electrical charge may be supplied to thepiezoelectric layer to change the thickness of the piezoelectric layerthus changing the distance of the mechanical stop to the nanometer-scalebeam.

Persons skilled in the art will appreciate that a nanometer-scale beammay have an average range, and average midpoint, of motion. Such anaverage range, and average midpoint, of motion may be electrically(e.g., electrostatically and electromagnetically) or heat influenced andcontrolled.

Persons skilled in the art will also appreciate that a nanometer-scalebeam may have an orientation at which the nanometer-scale beam is notbent with respect to a mounting (either vertically, horizontally, orboth vertically and horizontally). A nanometer-scale beam may move inparticular directions at particular average, or maximum distances for aparticular environment (e.g., a vacuum having a particular heat). Suchaverage and/or maximum distances may be electrically (e.g.,electrostatically and electromagnetically) or thermally controlled.

Nanometer-scale position 2277 may be the position that free-movingportion 2279 of nanometer scale beam 2278 is not bent with respect tostationary portion 2280 of nanometer-scale beam 2278 (e.g., not benthorizontally or horizontally and vertically). Due to mechanical stop2276, nanometer-scale beam 2278 may not physically move past, forexample, position 2274. Thus, nanometer-scale beam 2278 may only move,at maximum, distance 2272. Distance 2272, however, may be changed. Forexample, a charge of a particular polarity (e.g., negative) may beplaced on nanometer-scale beam 2278 (e.g., via an electricallyconducting mount) and a charge of that same polarity may be placed on,or around, stop 2276. The electrostatic repulsion forces of these twocharges may, for example, never allow beam 2278 to physically contactstop 2276—thus shortening distance 2272. Persons skilled in the art willappreciate that the repulsion forces may be configured to a degree suchthat nanometer-scale beam 2278 never, or rarely, goes past location 2277(e.g., the location where a nanometer-scale beam may be straight, andnot bent, either horizontally or horizontally and vertically). A chargemember layer may, for example, be placed about position 2273 tosimilarly modify distance 2271 so that nanometer-scale beam 2278 may notmove to position 2273.

No mechanical stop may be provided to limit the movement of ananometer-scale beam in particular locations that the nanometer-scalebeam could otherwise move into. A nanometer-scale beam may, without amechanical stop, take on a particular oscillation frequency in aparticular environment. For example, a nanometer-scale beam suspended atone end to form a cantilever may oscillate in a particular range offrequencies in a vacuum at a particular temperature. That samenanometer-scale beam may oscillate at a different range of frequenciesin the same vacuum, but at a different particular thresholds. Chargemember layers and/or mechanical stops may be utilized to change therange of the frequency of collision with a mechanical stop for aparticular temperature.

Sources of heat may be provided from a variety of sources. For example,a source of heat may be a microprocessor that is in operation. Anothersource of heat may be a battery that is in operation. Yet another sourceof heat may be circuitry that is in operation. Additional sources ofheat may take the form of, for example, the sun, a source of light(e.g., a lamp or LED), or combusting fuel.

Persons skilled in the art will appreciate that the thickness of amechanical stop if, for example, produced from the same material as arelated nanometer-scale beam may be configured to be greater than thethickness of the nanometer-scale beam. Such a greater thickness mayallow a stop to receive an impact from a related nanometer-scale beamwithout bending. The height of a mechanical stop (e.g., a mechanicalcylindrical-shaped stop aligned vertically with respect to a base) maybe reduced in order to increase the stiffness of the mechanical stop.

Generally, the mechanical stop may be thicker, made from a stiffermaterial, and/or shorter than a nanometer-scale beam such that themechanical stop does not bend substantially when physically hit by oneor more nanometer-scale beams. A stop may, as in one example, be amulti-walled carbon nanotube while a nanometer-scale beam is a singlewalled carbon nanotube. Alternatively, if three nanometer-scale beamsmay contact a mechanical stop at any one time, the mechanical stop maybe, for example, three times thicker than the largest one of the threenanometer-scale beams (and the three beams may have approximately thesame dimensions).

Fuel may be placed in a chamber and the fuel may be combusted.Combusting fuel may provide heat that can be used to powernanometer-scale pumps which may, in turn, circulate remaining heat bypumping the working substance (e.g., exhaust or a working substanceheated by the combusting fuel). Control circuitry 2290 may be utilizedto provide control signals to, for example, any number of charge memberlayers (e.g., charge member layer 2212) or nanometer-scale beams (e.g.,nanometer-scale beam 2226). Similarly, control signals may be providedto control circuitry 2290 to instruct control circuitry 2290 how tocontrol a particular charge member layer or nanometer-scale beam. Suchcontrol signals may be provided from, for example, one or more logiccircuits (e.g., microprocessors) or sensors (e.g., a sensor sensing themovement of a nanometer-scale beam). Persons skilled in the art willappreciate that a working substance pumped by one or morenanometer-scale beams may be utilized in a variety of ways. For example,an electrical engine-generator may be coupled to an output aperture. Aworking substance may then be pumped from an input aperture to, andthrough, the output aperture such that the working substance is pushedthrough an electrical engine-generator. The electrical engine-generatormay then convert the kinetic energy of the working substance created bythe nanometer-scale pumps into an electrical energy and supply thiselectrical energy to, for example, one or more batteries.

FIG. 23 shows system 2300 that may include multiple nanometer-scalebeams fixed to one, or more, mounts 2310 in different directions. Forexample, four nanometer-scale beams 2321-2324 may be positioned at rightangles to one another along the same plane. Persons skilled in the artwill appreciate that two additional nanometer-scale pumps may be locatedat right angles on the z-plane. Such a configuration may provide pumpingin every direction on the plane that the pumps are located in. With theinclusion of two additional pumps in the z-plane, the assembly mayprovide thrust in any direction in the three dimensional x-y-z plane.Each nanometer-scale beam may be provided with one, two, or any numberof mechanical stops. For example, mechanical stop 2331 may be located tothe left of nanometer-scale beam 2321 and mechanical stop 2340 may belocated to the right of nanometer-scale beam 2321. Charge member layers2330 and 2341 may provide support to stops 2331 and 2340, respectivelyas well as electrostatically influence nanometer-scale beam 2321. Acharge member layer and stop combination may also be provided above, andbelow nanometer-scale beam 2321. An electrically conductive stop mayalternatively, for example, be utilized such that the functionality of acharge member layer may be realized in the electrically conductive stop(e.g., a carbon nanotube). Thus, nanometer-scale beams may be bent, orinfluenced, in a particular direction. For example, nanometer-scalebeams 2351 and 2352 may be displaced, or influenced, in a desireddirections.

FIG. 24 shows system 2400 that may include multiple nanometer-scalebeams aligned horizontally, and stacked vertically, to one another.System 2400 may be, for example, cross-sectional J-J (i.e., line 2399)of system 2300 of FIG. 23. For example nanometer-scale beams 2441-2443may be stacked vertically and may be influenced by charge members 2420and 2430 and/or stops 2421 and 2431. Nanometer-scale beams 2441-2443 maybe coupled to a mount that is, in turn, coupled to base 2410.Nanometer-scale beam 2453 illustrates how all the nanometer-scale beamsmay be controlled to move in the same direction by a mechanical stop(e.g., stops 2451 and 2452) or charge member layers. Mechanical stopsmay be tilted at an angle from a base. For example, mechanical stops2481 and 2482 may have a slope that is not perpendicular to base 2480.As such, the range of the movement of nanometer-scale beams 2483-2485may be limited (or influenced) differently by a single mechanical stopor a charge member layer (e.g., an electrically conductive mechanicalstop imposed with a charge). Such a configuration may, for example,influence a group of nanometer-scale beams to create (e.g., pump) avortex effect. All nanometer-scale beams may be attached to the samemount (which may be electrically conductive and operable to receive acharge). Stops 2481 and 2482 may extend the length of nanometer-scalebeams 2483-2485 or may be, for example, nanotubes that only cover alength of nanometer-scale beams 2483-2485 that is approximately equal tothe width of the nanotubes.

Persons skilled in the art will appreciate that a pump having ananometer-scale beam may be utilized, for example, as a compressor, fan,and propulsion device. Moreover, a pump system may work without anywindows. For example, a housing may form a channel with an inlet and anoutlet. An array of nanometer-scale beams may be free to move andvibrate due to thermal motion and mechanical stops may be near thevibrating portion of these nanometer-scale beams to prevent thenanometer-scale beam from fully extending in the direction of the inlet.To stop a nanometer-scale beam from being able to move, or to stop thepump, a voltage of one polarity may be applied to a nanometer-scale beamand, for example, a voltage of another polarity may be applied to eitherthe mechanical stop or a portion of the housing. Thus, thenanometer-scale beam may be forced to clamp to a particular portion of asystem so that the nanometer-scale beam cannot move. Alternatively, oneor more inlets/outlets and/or windows may be closed. Such openings maybe closed, for example, by placing something over the openings such asmoving one or more nanometer-scale beams into the openings to block theopenings.

From the foregoing description, persons skilled in the art willrecognize that this invention provides nanometer-scale electromechanicalassemblies systems. Nanometer-scale electromechanical assemblies andsystems are used in a variety of applications. For example, properlytailored nanometer-scale electromechanical assemblies and systems can beutilized in applications such as transistors, amplifiers, memory cells,automatic switches, diodes, variable resistors, magnetic field sensors,temperature sensors, electric field sensors, pumps, compressors, andlogic components.

In addition, persons skilled in the art will appreciate that the variousconfigurations described herein may be combined without departing fromthe present invention. It will also be recognized that the invention maytake many forms other than those disclosed in this specification.Accordingly, it is emphasized that the invention is not limited to thedisclosed methods, systems and apparatuses, but is intended to includevariations to and modifications therefrom which are within the spirit ofthe following claims.

1. A system comprising: a housing having a plurality of windows; and ananometer-scale beam having at least one portion that is free-to-move,but inoperable to move through at least one of said plurality of windowsdue to a mechanical stop.
 2. A system comprising: a base; a workingsubstance having a plurality of molecules; a nanometer-scale beamcoupled to said base and having a portion that is free-to-move, whereinsaid nanometer-scale beam is immersed in said working substance; and amechanical stop coupled to said base and located within the vicinity ofsaid nanometer-scale beam such that said mechanical stop limits themovement of said free-moving portion, wherein said limited motion ofsaid free-moving portion alters the average velocity of said workingsubstance.
 3. The system of claim 2, wherein said nanometer-scale beamis provided in a cantilever configuration.
 4. The system of claim 2,wherein said nanometer-scale beam is provided in a jump ropeconfiguration.
 5. The system of claim 2, wherein said free-movingportion is operable to move into a position that is substantiallyparallel to said base.
 6. The system of claim 2, wherein saidfree-moving portion is operable to move into a position that issubstantially parallel to said base and said mechanical stop is locatedin a position that is substantially vertical to said base.
 7. The systemof claim 2, wherein said mechanical stop is the only structure limitingthe movement of said free-moving portion and said mechanical stop islocated on one side of said nanometer-scale beam to limit the range ofmovement of said free-moving portion on said one side.
 8. The system ofclaim 2, wherein said mechanical stop is the only structure limiting themovement of said free-moving portion, said mechanical stop is located onone side of said nanometer-scale beam to limit the range of movement ofsaid free-moving portion on said one side and said nanometer-scale beamincludes a stationary portion that is coupled to said base via amounting.
 9. The system of claim 2, wherein said mechanical stopcomprises a layer of carbon.
 10. The system of claim 2, wherein saidmechanical stop is thicker than said nanometer-scale beam.
 11. Thesystem of claim 2, wherein said mechanical stop is cylindrical in shape.12. The system of claim 2, wherein said mechanical stop is fabricatedfrom the same material as said nanometer-scale beam.
 13. The system ofclaim 2, wherein said mechanical stop is fabricated from a firstmaterial, said nanometer-scale beam is fabricated from a secondmaterial, and said first material has a greater stiffness per unitvolume than said second material.
 14. The system of claim 2, wherein thelongest dimension of said nanometer-scale stop is less than the longestdimension of said mechanical beam.
 15. The system of claim 2, whereinsaid nanometer-scale beam is immersed in a partial vacuum and a sourceof heat provides heat to said nanometer-scale beam to cause saidfree-moving portion to move.
 16. The system of claim 2, wherein thermalvibrations in said working substance or said nanometer-scale beam causessaid free-moving portion to move.
 17. The system of claim 2, whereinsaid nanometer-scale beam is provided in a housing having at least oneinput aperture and one output aperture.
 18. The system of claim 2,wherein said nanometer-scale beam is provided in a housing having atleast one input aperture and one output aperture and saidnanometer-scale beam pumps a working substance from said input apertureto said output aperture.
 19. The system of claim 2, wherein saidnanometer-scale beam is provided in a housing having at least one inputaperture and one output aperture, a working substance is pushed throughsaid input aperture, and said nanometer-scale beam pumps said workingsubstance through said output aperture.
 20. The system of claim 2,wherein said nanometer-scale beam is provided in a housing having atleast two apertures.
 21. The system of claim 2, further comprising asource of heat for providing heat to said working substance or saidnanometer-scale beam.
 22. The system of claim 2, further comprising asource of heat for providing heat to said working substance or saidnanometer-scale beam, wherein said source of heat is a microprocessor.23. The system of claim 2, further comprising a source of heat forproviding heat to said working substance or said nanometer-scale beam,wherein said source of heat is a battery.
 24. The system of claim 2,further comprising a source of heat having an exhaust, wherein saidexhaust is provided to said free-moving portion.
 25. The system of claim2, wherein said nanometer-scale beam is a nanotube.
 26. The system ofclaim 2, wherein said nanometer-scale beam is a nanowire.
 27. The systemof claim 2, wherein said nanometer-scale beam is not electricallyconductive.
 28. The system of claim 2, wherein said mechanical stop isnot electrically conductive.
 29. The system of claim 2, wherein saidmechanical stop is electrically conductive.
 30. The system of claim 2,wherein said nanometer-scale beam is electrically conductive.
 31. Thesystem of claim 2, wherein said nanometer-scale beam is electricallyconductive and said nanometer-scale beam is electrically isolated bybeing suspended from at least one non-conductive mountings.
 32. Thesystem of claim 2, wherein said mechanical stop is electricallyconductive and said nanometer-scale beam is electrically conductive. 33.The system of claim 2, wherein said mechanical stop is not electricallyconductive and said nanometer-scale beam is electrically conductive. 34.The system of claim 2, wherein said mechanical stop is electricallyconductive and said mechanical stop is electrically isolated by beingcoupled only to a non-conductive layer.
 35. The system of claim 2,further comprising control circuitry for providing an electrical chargeto said nanometer-scale beam.
 36. The system of claim 2, furthercomprising control circuitry for providing an electrical charge to saidmechanical stop.
 37. The system of claim 2, further comprising controlcircuitry for providing an electrical charge to a charge member layerprovided in the proximity of said free-moving portion.
 38. The system ofclaim 2, further comprising control circuitry for providing a firstelectrical charge to a first charge member layer provided in theproximity of said free-moving portion and a second electrical charge toa second charge member layer provided in the proximity of saidfree-moving portion.
 39. The system of claim 2, further comprisingcontrol circuitry for providing a first electrical charge to a firstcharge member layer provided in the proximity of said free-movingportion, a second electrical charge to a second charge member layerprovided in the proximity of said free-moving portion, and a thirdelectrical charge to said nanometer-scale beam.
 40. The system of claim2, further comprising control circuitry for providing a first electricalcharge to a first charge member layer provided in the proximity of saidfree-moving portion, a second electrical charge to a second chargemember layer provided in the proximity of said free-moving portion, athird electrical charge to said nanometer-scale beam, and said controlcircuitry does not provide an electrical charge to said mechanical stop.41. The system of claim 2, wherein an electrical charge is provided tosaid nanometer-scale beam.
 42. The system of claim 2, wherein anelectrical charge is provided to said mechanical stop.
 43. The system ofclaim 2, wherein an electrical charge is provided to a charge memberlayer located in the vicinity of said free-moving portion.
 44. Thesystem of claim 2, further comprising a charge member layer located inthe vicinity of said free-moving portion.
 45. The system of claim 2,further comprising a charge member layer located in the vicinity of saidfree-moving portion wherein a non-conductive layer is provided betweensaid charge member layer and said free-moving portion.
 46. The system ofclaim 2, further comprising a charge member layer located in thevicinity of said free-moving portion wherein a non-conductive layer isprovided between said charge member layer and said free-moving portionand a charge is provided to said charge member layer.
 47. The system ofclaim 2, further comprising a charge member layer located in thevicinity of said free-moving portion wherein a non-conductive layer isprovided between said charge member layer and said free-moving portionand a first charge is provided to said charge member layer having onepolarity and a second charge having an opposite polarity is provided tosaid nanometer-scale beam.
 48. The system of claim 2, further comprisinga charge member layer located in the vicinity of said free-movingportion wherein a non-conductive layer is provided between said chargemember layer and said free-moving portion and a first charge is providedto said charge member layer having one polarity and a second chargehaving the same polarity is provided to said nanometer-scale beam. 49.The system of claim 2, further comprising a second mechanical stoppositioned to limit the movement of said nanometer-scale beam.
 50. Thesystem of claim 2, further comprising a second nanometer-scale beamhaving a second free-moving portion, wherein said mechanical stop limitsthe movement of said second nanometer-scale beam.
 51. The system ofclaim 2, wherein said base is spherical.
 52. The system of claim 2,wherein said base is spherical and said nanometer-scale beam providesthrust to move said spherical base.
 53. The system of claim 2, furthercomprising a magnetic field generator that provides a magnetic field onsaid nanometer-scale beam.
 54. The system of claim 2, further comprisinga magnetic field generator that provides magnetic field on saidnanometer-scale beam and a current is provided through saidnanometer-scale beam to electromagnetically interact with said magneticfield.
 55. The system of claim 2, wherein said nanometer-scale beam iselectrically influenced.
 56. The system of claim 2, wherein saidnanometer-scale beam is electrically influenced electrostatically. 57.The system of claim 2, wherein said nanometer-scale beam is electricallyinfluenced electromagnetically.
 58. The system of claim 2, furthercomprising a source of heat for providing heat to said working substanceor said nanometer-scale beam, wherein the temperature of said heat ischanged, said free-moving portion is moving, and said change intemperature changes the speed of said movement.
 59. The system of claim2, wherein said nanometer-scale beam is operable to move both verticallyand horizontally with respect to said base.
 60. The system of claim 2,where said plurality of molecules move, on average, at a zero velocityand said nanometer-scale beam impacting said mechanical stop causes saidplurality of molecules to move, on average, at a non-zero velocity in adirection.
 61. The system of claim 2, wherein said nanometer-scale beamrepeatedly impacts said mechanical stop and causes said workingsubstance to flow in a direction.
 62. The system of claim 2, whereinsaid nanometer-scale beam repeatedly impacts said mechanical stop andcauses said working substance to flow in a direction opposite themechanical stop with respect to said nanometer-scale beam.
 63. A systemcomprising: a housing; a working substance having a plurality ofmolecules; a plurality of nanometer-scale pumps immersed in said workingsubstance and coupled to said housing, wherein said plurality ofnanometer-scale pumps alters the average velocity of said workingsubstance and each one of said nanometer-scale pumps comprises: ananometer-scale beam, having at least one portion that is free-to-moveand having at least one other portion that is anchored to said housing;and a mechanical stop located in the vicinity of said nanometer-scalebeam that limits the movement of said nanometer-scale beam, wherein saidlimited motion of said free-moving portion alters the velocity of atleast one of said plurality of molecules.
 64. The system of claim 63,wherein said nanometer-scale beam is provided in a cantileverconfiguration.
 65. The system of claim 63, wherein said nanometer-scalebeam is provided in a jump rope configuration.
 66. The system of claim63, wherein said free-moving portion is operable to move into a positionthat is substantially parallel to said housing.
 67. The system of claim63, wherein said free-moving portion is operable to move into a positionthat is substantially parallel to said base and said mechanical stop islocated in a position that is substantially vertical to said housing.68. The system of claim 63, wherein said mechanical stop is the onlystructure limiting the movement of said free-moving portion and saidmechanical stop is located on one side of said nanometer-scale beam tolimit the range of movement of said free-moving portion on said oneside.
 69. The system of claim 63, wherein said mechanical stop comprisesa layer of carbon.
 70. The system of claim 63, wherein said mechanicalstop is thicker than said nanometer-scale beam.
 71. The system of claim63, wherein said mechanical stop is cylindrical in shape.
 72. The systemof claim 63, wherein said mechanical stop is fabricated from the samematerial as said nanometer-scale beam.
 73. The system of claim 63,wherein said mechanical stop is fabricated from a first material, saidnanometer-scale beam is fabricated from a second material, and saidfirst material has a greater stiffness per unit volume than said secondmaterial.
 74. The system of claim 63, wherein the longest dimension ofsaid nanometer-scale stop is less than the longest dimension of saidmechanical beam.
 75. The system of claim 63, wherein saidnanometer-scale beam is immersed in a partial vacuum and a source ofheat provides heat to said nanometer-scale beam to cause saidfree-moving portion to move.
 76. The system of claim 63, wherein thermalvibrations in said working substance or said nanometer-scale beam causessaid free-moving portion to move.
 77. The system of claim 63, whereinsaid housing includes at least one input aperture and one outputaperture.
 78. The system of claim 63, wherein housing includes at leastone input aperture and one output aperture and said nanometer-scale beampumps a working substance from said input aperture to said outputaperture.
 79. The system of claim 63, wherein said housing includes atleast one input aperture and one output aperture, a working substance ispushed through said input aperture, and said nanometer-scale beam pumpssaid working substance through said output aperture.
 80. The system ofclaim 63, wherein housing includes at least two apertures.
 81. Thesystem of claim 63, further comprising a source of heat for providingheat to said working substance or said nanometer-scale beam.
 82. Thesystem of claim 63, further comprising a source of heat for providingheat to said working substance or said nanometer-scale beam, whereinsaid source of heat is a microprocessor.
 83. The system of claim 63,further comprising a source of heat for providing heat to said workingsubstance or said nanometer-scale beam, wherein said source of heat is abattery.
 84. The system of claim 63, further comprising a source of heathaving an exhaust, wherein said exhaust is provided to said free-movingportion.
 85. The system of claim 63, wherein said nanometer-scale beamis a nanotube.
 86. The system of claim 63, wherein said nanometer-scalebeam is a nanowire.
 87. The system of claim 63, wherein saidnanometer-scale beam is not electrically conductive.
 88. The system ofclaim 63, wherein said mechanical stop is not electrically conductive.89. The system of claim 63, wherein said mechanical stop is electricallyconductive.
 90. The system of claim 63, wherein said nanometer-scalebeam is electrically conductive.
 91. The system of claim 63, whereinsaid nanometer-scale beam is electrically conductive and saidnanometer-scale beam is electrically isolated by being suspended from atleast one non-conductive mountings.
 92. The system of claim 63, whereinsaid mechanical stop is electrically conductive and said nanometer-scalebeam is electrically conductive.
 93. The system of claim 63, whereinsaid mechanical stop is not electrically conductive and saidnanometer-scale beam is electrically conductive.
 94. The system of claim63, wherein said mechanical stop is electrically conductive and saidmechanical stop is electrically isolated by being coupled only to anon-conductive layer.
 95. The system of claim 63, further comprisingcontrol circuitry for providing an electrical charge to saidnanometer-scale beam.
 96. The system of claim 63, further comprisingcontrol circuitry for providing an electrical charge to said mechanicalstop.
 97. The system of claim 63, further comprising control circuitryfor providing an electrical charge to a charge member layer provided inthe proximity of said free-moving portion.
 98. The system of claim 63,further comprising control circuitry for providing a first electricalcharge to a first charge member layer provided in the proximity of saidfree-moving portion and a second electrical charge to a second chargemember layer provided in the proximity of said free-moving portion. 99.The system of claim 63, further comprising control circuitry forproviding a first electrical charge to a first charge member layerprovided in the proximity of said free-moving portion, a secondelectrical charge to a second charge member layer provided in theproximity of said free-moving portion, and a third electrical charge tosaid nanometer-scale beam.
 100. The system of claim 63, furthercomprising control circuitry for providing a first electrical charge toa first charge member layer provided in the proximity of saidfree-moving portion, a second electrical charge to a second chargemember layer provided in the proximity of said free-moving portion, athird electrical charge to said nanometer-scale beam, and said controlcircuitry does not provide an electrical charge to said mechanical stop.101. The system of claim 63, wherein an electrical charge is provided tosaid nanometer-scale beam.
 102. The system of claim 63, wherein anelectrical charge is provided to said mechanical stop.
 103. The systemof claim 63, wherein an electrical charge is provided to a charge memberlayer located in the vicinity of said free-moving portion.
 104. Thesystem of claim 63, further comprising a charge member layer located inthe vicinity of said free-moving portion.
 105. The system of claim 63,further comprising a charge member layer located in the vicinity of saidfree-moving portion wherein a non-conductive layer is provided betweensaid charge member layer and said free-moving portion.
 106. The systemof claim 63, further comprising a charge member layer located in thevicinity of said free-moving portion wherein a non-conductive layer isprovided between said charge member layer and said free-moving portionand a charge is provided to said charge member layer.
 107. The system ofclaim 63, further comprising a charge member layer located in thevicinity of said free-moving portion wherein a non-conductive layer isprovided between said charge member layer and said free-moving portionand a first charge is provided to said charge member layer having onepolarity and a second charge having an opposite polarity is provided tosaid nanometer-scale beam.
 108. The system of claim 63, furthercomprising a charge member layer located in the vicinity of saidfree-moving portion wherein a non-conductive layer is provided betweensaid charge member layer and said free-moving portion and a first chargeis provided to said charge member layer having one polarity and a secondcharge having the same polarity is provided to said nanometer-scalebeam.
 109. The system of claim 63, further comprising a secondmechanical stop positioned to limit the movement of said nanometer-scalebeam.
 110. The system of claim 63, further comprising a secondnanometer-scale beam having a second free-moving portion, wherein saidmechanical stop limits the movement of said second nanometer-scale beam.111. The system of claim 63, wherein said housing is spherical.
 112. Thesystem of claim 63, wherein said housing is spherical and saidnanometer-scale beam provides thrust to move said spherical base. 113.The system of claim 63, further comprising a magnetic field generatorthat provides a magnetic field on said nanometer-scale beam.
 114. Thesystem of claim 63, further comprising a magnetic field generator thatprovides magnetic field on said nanometer-scale beam and a current isprovided through said nanometer-scale beam to electromagneticallyinteract with said magnetic field.
 115. The system of claim 63, whereinsaid nanometer-scale beam is electrically influenced.
 116. The system ofclaim 63, wherein said nanometer-scale beam is electrically influencedelectrostatically.
 117. The system of claim 63, wherein saidnanometer-scale beam is electrically influenced electromagnetically.118. The system of claim 63, further comprising a source of heat forproviding heat to said working substance or said nanometer-scale beam,wherein the temperature of said heat is changed, said free-movingportion is moving, and said change in temperature changes the speed ofsaid movement.
 119. The system of claim 63, wherein said nanometer-scalebeam is operable to move both vertically and horizontally with respectto said base.
 120. The system of claim 63, where said plurality ofmolecules move, on average, at a zero velocity and said nanometer-scalebeam impacting said mechanical stop causes said plurality of moleculesto move, on average at a non-zero velocity in a direction.
 121. Thesystem of claim 63, wherein said nanometer-scale beam repeatedly impactssaid mechanical stop and causes said working substance to flow in adirection.
 122. The system of claim 63, wherein said nanometer-scalebeam repeatedly impacts said mechanical stop and causes said workingsubstance to flow in a direction opposite the mechanical stop withrespect to said nanometer-scale beam.
 123. The system of claim 63,wherein said nanometer-scale pumps increases the velocity, on average,of said working substance in a direction.
 124. The system of claim 63,wherein said nanometer-scale pumps cause said working substance to flowin a direction.
 125. The system of claim 63, wherein saidnanometer-scale pumps are operable to be controlled to cause saidworking substance to flow in one of a plurality of pre-determineddirections.
 126. The system of claim 63, further comprising controlcircuitry for controlling the direction that said plurality ofnanometer-scale pumps move said working substance.
 127. A systemcomprising: a base; a working substance having a plurality of molecules;a nanometer-scale beam coupled to said base and having at least oneportion that is free-to-move, wherein said nanometer-scale beam isimmersed in said working substance; and a mechanical stop coupled tosaid base and located within the vicinity of said nanometer-scale beamsuch that said mechanical stop limits the movement of said free-movingportion, wherein said nanometer-scale beam increases the velocity, onaverage, of said plurality of molecules in a direction away from saidmechanical stop with respect to said nanometer-scale beam.
 128. A systemcomprising: a base; a working substance having a plurality of molecules;a nanometer-scale beam coupled to said base and having at least oneportion that is free-to-move, wherein said nanometer-scale beam isimmersed in said working substance; and a mechanical stop coupled tosaid base and located within the vicinity of said nanometer-scale beamsuch that said mechanical stop limits the movement of said free-movingportion, said nanometer-scale beam moves toward said mechanical stop ina first direction, said nanometer-scale beam impacts said mechanicalstop after moving towards said mechanical stop, said nanometer-scalebeam bounces off said mechanical stop and moves in a second direction,and said nanometer-scale beam increases the velocity of said pluralityof molecules in said second direction.
 129. A system comprising: a base;a working substance having a plurality of molecules; a nanometer-scalebeam coupled to said base and having a portion that is free-to-move,wherein said nanometer-scale beam is immersed in said working substance;and a mechanical stop coupled to said base and located within thevicinity of said nanometer-scale beam such that said mechanical stoplimits the movement of said free-moving portion, wherein the interactionbetween said free-moving portion and said mechanical stop alters theaverage velocity of said plurality of molecules.
 130. A systemcomprising: a base; a working substance having a plurality of molecules;a plurality of nanometer-scale pumps, wherein each one of said pluralityof nanometer-scale pumps comprises: a nanometer-scale beam; a mechanicalstop located in the vicinity of said nanometer-scale beam such that saidmechanical stop limits the movement of said nanometer-scale beam; andcircuitry, wherein a first control signal provided to said circuitrycauses said plurality of nanometer-scale pumps to pump said workingsubstance in a first direction and a second control signal provided tosaid control circuitry causes said plurality of nanometer-scale pumps topump said working substance in a second direction.
 131. A systemcomprising: a base; a working substance having a plurality of molecules;a nanometer-scale pump, wherein said nanometer-scale pump comprises: aplurality of nanometer-scale beams; and a mechanical stop located in thevicinity of said plurality of nanometer-scale beams such that saidmechanical stop limits the movement of each one of said plurality ofnanometer-scale beams.
 132. The system of claim 131, wherein saidlimited motion of said plurality of nanometer-scale beams alter theaverage velocity of said working substance.